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Optoelectronics Letters, Volume. 20, Issue 8, 497(2024)

RiSw: resistant to incomplete shooting watermarking scheme

Zhouliang WANG1... Wanni XIANG1, Weiya WANG1,* and Hu and LI2 |Show fewer author(s)
Author Affiliations
  • 1School of Information Engineering, Chang’an University, Xi’an 710064, China
  • 2College of Chemistry & Material Science, Northwest University, Xi’an 710069, China
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    WANG Zhouliang, XIANG Wanni, WANG Weiya, and LI Hu. RiSw: resistant to incomplete shooting watermarking scheme[J]. Optoelectronics Letters, 2024, 20(8): 497

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    Paper Information

    Received: Nov. 19, 2023

    Accepted: Apr. 7, 2024

    Published Online: Aug. 23, 2024

    The Author Email: Weiya WANG (weiwang@chd.edu.cn)

    DOI:10.1007/s11801-024-3255-6

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology