Augmenting photoluminescence of monolayer MoS<sub>2</sub> using high order modes in a metal dimer-on-film nanocavity

Shiyin Cao; Liping Hou; Qifa Wang; Chenyang Li; Weixing Yu; Xuetao Gan; Kaihui Liu; Malin Premaratne; Fajun Xiao; Jianlin Zhao

doi:10.1364/PRJ.414613

Photonics Research, Volume. 9, Issue 4, 501(2021)

Augmenting photoluminescence of monolayer MoS₂ using high order modes in a metal dimer-on-film nanocavity

Shiyin Cao¹, Liping Hou¹, Qifa Wang¹, Chenyang Li¹, Weixing Yu², Xuetao Gan^1,5、*, Kaihui Liu³, Malin Premaratne⁴, Fajun Xiao^1,2,6、*, and Jianlin Zhao^1,7、*

Author Affiliations

¹MOE Key Laboratory of Material Physics and Chemistry under Extraordinary Conditions, and Shaanxi Key Laboratory of Optical Information Technology, School of Physical Science and Technology, Northwestern Polytechnical University, Xi’an 710129, China

²Key Laboratory of Spectral Imaging Technology of Chinese Academy of Sciences, Xi’an 710119, China

³State Key Laboratory for Mesoscopic Physics, Collaborative Innovation Centre of Quantum Matter, School of Physics, Peking University, Beijing 100871, China

⁴Advanced Computing and Simulation Laboratory (AχL), Department of Electrical and Computer Systems Engineering, Monash University, Clayton, VIC 3800, Australia

⁵e-mail: xuetaogan@nwpu.edu.cn

⁶e-mail: fjxiao@nwpu.edu.cn

⁷e-mail: jlzhao@nwpu.edu.cn

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Shiyin Cao, Liping Hou, Qifa Wang, Chenyang Li, Weixing Yu, Xuetao Gan, Kaihui Liu, Malin Premaratne, Fajun Xiao, Jianlin Zhao, "Augmenting photoluminescence of monolayer MoS₂ using high order modes in a metal dimer-on-film nanocavity," Photonics Res. 9, 501 (2021)

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Paper Information

Category: Surface Optics and Plasmonics

Received: Nov. 10, 2020

Accepted: Feb. 1, 2021

Published Online: Mar. 25, 2021

The Author Email: Xuetao Gan (xuetaogan@nwpu.edu.cn), Fajun Xiao (fjxiao@nwpu.edu.cn), Jianlin Zhao (jlzhao@nwpu.edu.cn)

DOI:10.1364/PRJ.414613

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology