High Power Laser and Particle Beams, Volume. 36, Issue 12, 122003(2024)

Fabrication technology of Al/Ta-Nb alloy impedance matching target

Zhiyong Xie... Junjian Ye*, Guo Jia, Zhiheng Fang, Zhiyu He, Hua Shu, Yuchun Tu, Xiuguang Huang and Sizu Fu |Show fewer author(s)
Author Affiliations
  • Shanghai Institute of Laser Plasma, CAEP, Shanghai 201800, China
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    Figures & Tables(7)
    Schematic configuration of Al/Ta-Nb alloy impedance matching target
    Experimental setup and device of femtosecond laser ablation
    Microscopic image of Al/Ta-Nb alloy impedance match target
    Observation image of Ta-Nb alloy step
    White light interferometer image of Ta-Nb alloy
    White light interferometer image of Al/Ta-Nb alloy impedance matching target
    • Table 1. Comparison of required and measured values of Al/Ta-Nb impedance matching target

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      Table 1. Comparison of required and measured values of Al/Ta-Nb impedance matching target

      thickness of Al step/μmthickness of Ta-Nb step/μmgap width/μmRq of Al/nmRq of Ta-Nb/nm
      required value20±113±2<120<50<50
      measured value20.0013.0090.1033.8348.65
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    Zhiyong Xie, Junjian Ye, Guo Jia, Zhiheng Fang, Zhiyu He, Hua Shu, Yuchun Tu, Xiuguang Huang, Sizu Fu. Fabrication technology of Al/Ta-Nb alloy impedance matching target[J]. High Power Laser and Particle Beams, 2024, 36(12): 122003

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    Paper Information

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    Received: Jan. 19, 2024

    Accepted: Sep. 29, 2024

    Published Online: Jan. 15, 2025

    The Author Email: Ye Junjian (18334741@qq.com)

    DOI:10.11884/HPLPB202436.240025

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