High Power Laser and Particle Beams, Volume. 36, Issue 12, 122003(2024)

Fabrication technology of Al/Ta-Nb alloy impedance matching target

Zhiyong Xie... Junjian Ye*, Guo Jia, Zhiheng Fang, Zhiyu He, Hua Shu, Yuchun Tu, Xiuguang Huang and Sizu Fu |Show fewer author(s)
Author Affiliations
  • Shanghai Institute of Laser Plasma, CAEP, Shanghai 201800, China
  • show less

    To obtain the equation of state (EOS) of tantalum-niobium alloy (Ta-Nb) materials under high pressure, a type of Al/Ta-Nb impedance matching target for laser EOS experiments was fabricated. The processes of precision rolling and femtosecond laser cutting of Ta-Nb alloy foil were studied. A step sample of Ta-Nb alloy with a thickness of 13 μm and a width of 400 μm was obtained. Ta-Nb alloy step was assembled with Al standard material using polyvinyl alcohol (PVA) hydrosol. The surface morphology, step thickness and sample density of the target were measured by white light interferometer and electronic densitometer. The results show that the Al/Ta-Nb alloy impedance matching target fabricated can meet the requirements of laser EOS experiments.

    Keywords
    Tools

    Get Citation

    Copy Citation Text

    Zhiyong Xie, Junjian Ye, Guo Jia, Zhiheng Fang, Zhiyu He, Hua Shu, Yuchun Tu, Xiuguang Huang, Sizu Fu. Fabrication technology of Al/Ta-Nb alloy impedance matching target[J]. High Power Laser and Particle Beams, 2024, 36(12): 122003

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Jan. 19, 2024

    Accepted: Sep. 29, 2024

    Published Online: Jan. 15, 2025

    The Author Email: Ye Junjian (18334741@qq.com)

    DOI:10.11884/HPLPB202436.240025

    Topics