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Acta Optica Sinica, Volume. 32, Issue 8, 805001(2012)

Analysis of Mask Shadowing Effects in Extreme-Ultraviolet Lithography

Cao Yuting1,2、*, Wang Xiangzhao1,2, Bu Yang1,2, and Liu Xiaolei1,2
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    Article index updated:May. 20, 2024

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    Cao Yuting, Wang Xiangzhao, Bu Yang, Liu Xiaolei. Analysis of Mask Shadowing Effects in Extreme-Ultraviolet Lithography[J]. Acta Optica Sinica, 2012, 32(8): 805001

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    Paper Information

    Category: Diffraction and Gratings

    Received: Mar. 6, 2012

    Accepted: --

    Published Online: Jun. 27, 2012

    The Author Email: Yuting Cao (cytoe@163.com)

    DOI:10.3788/aos201232.0805001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology