Fabrication and characterization of high-damage resis-tance Zn-diffused MgO: PPLN ridge waveguides

Xing CHENG; Xinkai FENG; Lei MA; Jiaying CHEN; Huaixi CHEN; Wanguo and LIANG

doi:10.1007/s11801-024-3051-3

Optoelectronics Letters, Volume. 20, Issue 1, 12(2024)

Fabrication and characterization of high-damage resis-tance Zn-diffused MgO: PPLN ridge waveguides

Xing CHENG^1,2,3, Xinkai FENG^2,3, Lei MA^2,3, Jiaying CHEN^2,3, Huaixi CHEN^2,3、*, and Wanguo and LIANG^2,3

Author Affiliations

¹College of Chemistry, Fuzhou University, Fuzhou 350108, China

²Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou 350108, China

³Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350108, China

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CHENG Xing, FENG Xinkai, MA Lei, CHEN Jiaying, CHEN Huaixi, and LIANG Wanguo. Fabrication and characterization of high-damage resis-tance Zn-diffused MgO: PPLN ridge waveguides[J]. Optoelectronics Letters, 2024, 20(1): 12

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Paper Information

Received: Mar. 23, 2023

Accepted: Jul. 26, 2023

Published Online: May. 15, 2024

The Author Email: Huaixi CHEN (hxchen@fjirsm.ac.cn)

DOI:10.1007/s11801-024-3051-3

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology