Fig. 1. Cross sections of nodules^[19]

Fig. 2. Distributions of electric field, temperature and thermal stress induced by the nodule

Fig. 3. Typical damage morphologies of nodules

Fig. 4. Laser damage characteristics of nodular defects under the fluence of 79.8 J/cm^2[19]

Fig. 5. Typical damage morpholgies induced by nanoscale laser damage precursors

Fig. 6. Laser damage resistance enhancement of KDP crystals by continuous filtration techniques ^[27]

Fig. 7. Laser damage probability curves for KDP samples grown with no filter (NCF), only 0.1 μm filter (SCF) and two levels of filter (0.1 μm and 0.03 μm) (TCF) in continuous filtration unit^[28]

Fig. 8. Laser induced damage thresholds (LIDTs) and sizes of laser damage precursors in KDP crystals^[28]

Fig. 9. Damage morpholgies of HfO₂/SiO₂ multilayer films. (a) top view, (b)(c) section view. ^[31]

Fig. 10. Temperature simulation of the defect with the radius of 10 nm irradiated by the fluence of 0.8 J/cm²（1064 nm, 30 ps）^[31]

Fig. 11. Comparison of the temperature simulation and damage morphology^[31]

Fig. 12. Temperatures of different locations in the damage area^[31]

Fig. 13. Schematic diagram of small-beam raster-scan laser conditioning

Fig. 14. Laser conditioning platforms for large optics^[35]

Fig. 15. LIDTs of large-aperture dielectric films after laser conditioning (TM: transport mirror;ZJ: elbow mirror; PL: polarizer^[35]

Fig. 16. Surface state of the conditioned dielectric films^[35]

Fig. 17. Influences of plasma scalds on the beam quality and PSD2^[35]

Fig. 18. Laser damage resistance enhancement of KDP crystals by sub-nanosecond laser conditioning