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Optics and Precision Engineering, Volume. 11, Issue 4, 349(2003)

[in Chinese]

[in Chinese]1... [in Chinese]1, [in Chinese]1, [in Chinese]2, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]3, [in Chinese]3, [in Chinese]3, [in Chinese]3 and [in Chinese]4 |Show fewer author(s)

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References(2)

[2] [2] TIRSELL K G. Time resolved sub-KeV X-ray measurements using filtered X-ray diodes,UCRL-81478[Z],1979.

[4] [4] HEINLE R A,TIRSE1L K G.Filtered-mirror sub-keV X-ray measurement system[J].LaserProgram Annual Report,1979,5:5-5.7.

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. [J]. Optics and Precision Engineering, 2003, 11(4): 349

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Paper Information

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Received: Jan. 20, 2003

Accepted: --

Published Online: Nov. 3, 2006

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Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

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