Acta Optica Sinica, Volume. 34, Issue 10, 1022004(2014)

Source Optimization Method of Lithography Tools Based on Quadratic Programming

Yan Guanyong1,2、*, Li Sikun1, and Wang Xiangzhao1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(24)

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    CLP Journals

    [1] Lei Wang, Sikun Li, Xiangzhao Wang, Chaoxing Yang. Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm[J]. Acta Optica Sinica, 2017, 37(10): 1022001

    [2] Li Meixuan, Wang Li, Dong Lianhe. Development of a Novel Optical Variable Attenuator in Lithography Exposure System[J]. Chinese Journal of Lasers, 2018, 45(1): 103002

    [3] Jiang Haibo, Xing Tingwen. A Method of Source Optimization to Maximize Process Window[J]. Laser & Optoelectronics Progress, 2015, 52(10): 101101

    [4] Wang Lei, Li Sikun, Wang Xiangzhao, Yan Guanyong, Yang Chaoxing. Source Optimization Using Particle Swarm Optimization Algorithm in Optical Lithography[J]. Acta Optica Sinica, 2015, 35(4): 422002

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    Yan Guanyong, Li Sikun, Wang Xiangzhao. Source Optimization Method of Lithography Tools Based on Quadratic Programming[J]. Acta Optica Sinica, 2014, 34(10): 1022004

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Apr. 22, 2014

    Accepted: --

    Published Online: Sep. 9, 2014

    The Author Email: Guanyong Yan (ygy9911@163.com)

    DOI:10.3788/aos201434.1022004

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