Chinese Physics B, Volume. 29, Issue 9, (2020)

A synaptic transistor with NdNiO3

Xiang Wang1,2, Chen Ge1,2、†, Ge Li1, Er-Jia Guo1, Meng He1, Can Wang1,2,3, Guo-Zhen Yang1, and Kui-Juan Jin1,2,3
Author Affiliations
  • 1Institute of Physics, Chinese Academy of Sciences, Beijing 0090, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Songshan Lake Materials Laboratory, Dongguan 52808, China
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    Recently, neuromorphic devices for artificial intelligence applications have attracted much attention. In this work, a three-terminal electrolyte-gated synaptic transistor based on NdNiO3 epitaxial films, a typical correlated electron material, is presented. The voltage-controlled metal–insulator transition was achieved by inserting and extracting H+ ions in the NdNiO3 channel through electrolyte gating. The non-volatile conductance change reached 104 under a 2 V gate voltage. By manipulating the amount of inserted protons, the three-terminal NdNiO3 artificial synapse imitated important synaptic functions, such as synaptic plasticity and spike-timing-dependent plasticity. These results show that the correlated material NdNiO3 has great potential for applications in neuromorphic devices.

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    Xiang Wang, Chen Ge, Ge Li, Er-Jia Guo, Meng He, Can Wang, Guo-Zhen Yang, Kui-Juan Jin. A synaptic transistor with NdNiO3[J]. Chinese Physics B, 2020, 29(9):

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    Paper Information

    Received: May. 9, 2020

    Accepted: --

    Published Online: Apr. 29, 2021

    The Author Email: Ge Chen (kjjin@iphy.ac.cn)

    DOI:10.1088/1674-1056/aba60c

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