Chinese Journal of Quantum Electronics, Volume. 22, Issue 4, 646(2005)

The nanocrystalline silicon clusters form ed in thermally annealed a-Si:H films and the potolum inescence

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    References(3)

    [1] [1] Canham L T. Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers [J].Appl. Phys. Lett., 1990, 57(10): 1046-1048.

    [3] [3] Cullity B D, Stock S R. Elements of X-ray Diffraction [M]. New Jersey: Prentice-Hall, 2001.

    [4] [4] Richter H, Wang Z P, Ley L. The one phono Rama-spectrum in microcrystalline silicon [J]. Solid State Commun.,1981, 39(5): 625 629.

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    [in Chinese], [in Chinese], [in Chinese]. The nanocrystalline silicon clusters form ed in thermally annealed a-Si:H films and the potolum inescence[J]. Chinese Journal of Quantum Electronics, 2005, 22(4): 646

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    Paper Information

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    Received: Sep. 13, 2004

    Accepted: --

    Published Online: May. 15, 2006

    The Author Email: (xueqing232@126.com)

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