Journal of Inorganic Materials, Volume. 37, Issue 7, 795(2022)

High-uniformity Memristor Arrays Based on Two-dimensional MoTe2 for Neuromorphic Computing

Huikai HE1... Rui YANG2,3,*, Jian XIA3,4, Tingze WANG3,4, Dequan DONG3,4, and Xiangshui MIAO23 |Show fewer author(s)
Author Affiliations
  • 11. Nanhu Academy of Electronics and Information Technology, Jiaxing 314002, China
  • 22. Hubei Yangtze Memory Laboratories, Wuhan 430205, China
  • 33. Wuhan National Laboratory for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China
  • 44. State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
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    Figures & Tables(20)
    Characterization of MoTe2 film and electrical measurement of Au/Ti/MoTe2/Au/Ti device (a) Photo of the centimeter-scale MoTe2 film; (b) Raman spectrum of the MoTe2 film; (c) Optical image of the prepared memristive devices with the structure of Au/Ti/MoTe2/Au/Ti; (d) Optical image of a 3×3 memristor array
    Stable bipolar resistive switching behavior and retention characteristics of the MoTe2 device (a) 20 cycles of I-V curves with a compliance current of 3 mA; (b) Retention characteristics of the HRS and the LRS read at 0.1 V
    Fast switching and good endurance of the MoTe2 device (a) SET speed under the pulse with the amplitude 1.3 V; (b) RESET speed of the MoTe2 device under the pulse with the amplitude of -1.0 V; (c) Over 2000 switching cycles obtained by applying SET pulse of 1.7 V/700 ns and RESET pulse of -1.2 V/7 μs Colorful figures are available on website
    Cumulative distribution of (a) VSET and (b) VRESET of 24 devices
    Stable resistive switching of the MoTe2 array device after electroforming process (a) Electroforming process of the MoTe2 array device; (b) 20 cycles I-V curves of the MoTe2 array device with a compliance current of 5 Ma
    Potentiation and depression processes of the present deviceCircles are experimental results, red lines are fitting results with a phenomenological model $G=a+c{{e}^{-\beta N}}$
    Recognition accuracy for small and large handwritten digit images with experimental devices and ideal numericColorful figures are available on website
    Mechanism analysis of the memristive behavior in the MoTe2 device (a) I-V characteristics at HRS under different temperatures, with current increasing as the temperature increases Fitted data using the Schottky emission model for HRS is shown in the inset; (b) I-V characteristics at LRS at different temperatures, with current decreasing as the temperature increase, indicating a metallic characteristic
    PMMA transfer method
    XRD pattern of the MoTe2 film
    Fabrication process of the Au/Ti/MoTe2/Au/Ti device
    AFM image (a) of 3×3 memristor array, and the height profile (b) along the horizontal line and the vertical line
    Electroforming process of the device
    I-V curves of 24 Au/Ti/MoTe2/Au/Ti devices All devices show stable resistive switching with low cycle-to-cycle and device-to-device variability
    Cumulative distribution of device (a) HRS and (b) LRS of 24 devices
    Estimation of the array size for the prepared CVD-MoTe2 device (a) Sneak current path at read in a square crossbar array where all bits except the selected one are at LRS, and the equivalent circuit can be represented by three resistors (region 1, region 2 and region 3); (b) Dependence of the read margin on the crossbar line number for both 1R and 1T1R schemes
    I-V characteristics of the Pt/TaOx/TiO2/TaOx/Pt selector[4]
    I-V curves of 9 devices in 3×3 array
    Long-term potentiation and depression of the device using 50 potentiation (1 V, 500 ns) and depression (-1 V, 5 µs) presynaptic pulses
    • Table 1.

      Key resistance values and the corresponding maximum number of word lines/bit lines (N) with read margin >10%

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      Table 1.

      Key resistance values and the corresponding maximum number of word lines/bit lines (N) with read margin >10%

      Scheme$R_{\text{LRS}}^{\text{select}}$$R_{\text{HRS}}^{\text{select}}$$R_{\text{LRS}}^{\text{sneak}}$N
      1R15015001504
      1S1R35017001.25×105870
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    Huikai HE, Rui YANG, Jian XIA, Tingze WANG, Dequan DONG, Xiangshui MIAO. High-uniformity Memristor Arrays Based on Two-dimensional MoTe2 for Neuromorphic Computing [J]. Journal of Inorganic Materials, 2022, 37(7): 795

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    Paper Information

    Category: RESEARCH LETTER

    Received: Oct. 25, 2021

    Accepted: --

    Published Online: Jan. 10, 2023

    The Author Email: YANG Rui (yangrui@hust.edu.cn)

    DOI:10.15541/jim20210658

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