Chinese Journal of Quantum Electronics, Volume. 21, Issue 1, 48(2004)

Preparation and Properties of MgF2 Thin Film by Pulsed Laser Deposition

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    Optical thin films of MgF2 were successfully fabricated by pulsed laser deposition technique. The morphology and optical properties were investigated. The transmittance was 60%-80% in the visible light range, and more than 90% in the infrared range. The XPS showed the atom ratio of F: Mg in the obtained film was 1.9-2.1, very close to the bulk material. The refractive index of MgF2 thin film was -1.39 resulted from K-K calculation, also close to the value of 1.38 of the bulk MgF2.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Preparation and Properties of MgF2 Thin Film by Pulsed Laser Deposition[J]. Chinese Journal of Quantum Electronics, 2004, 21(1): 48

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    Paper Information

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    Received: Mar. 7, 2003

    Accepted: --

    Published Online: May. 15, 2006

    The Author Email: (gzwang@ustc.edu.cn)

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