Chinese Journal of Quantum Electronics, Volume. 21, Issue 1, 48(2004)
Preparation and Properties of MgF2 Thin Film by Pulsed Laser Deposition
Optical thin films of MgF2 were successfully fabricated by pulsed laser deposition technique. The morphology and optical properties were investigated. The transmittance was 60%-80% in the visible light range, and more than 90% in the infrared range. The XPS showed the atom ratio of F: Mg in the obtained film was 1.9-2.1, very close to the bulk material. The refractive index of MgF2 thin film was -1.39 resulted from K-K calculation, also close to the value of 1.38 of the bulk MgF2.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Preparation and Properties of MgF2 Thin Film by Pulsed Laser Deposition[J]. Chinese Journal of Quantum Electronics, 2004, 21(1): 48