Acta Optica Sinica, Volume. 26, Issue 6, 938(2006)

Electrochromism of WO3 Films Deposited by Mid-Frequency Dual-Target Magnetron Sputtering Method

[in Chinese]*, [in Chinese], [in Chinese], and [in Chinese]
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    References(3)

    [2] [2] C. G. Granqvist, E. Avendano, A. Azens. Electrochromic coatings and devices: survey of some recent advances[J]. Thin Solid Films, 2003, 442(1~2): 201~211

    [3] [3] E. Washizu, A. Yamamoto, Y. Abe et al.. Optical and electrochromic properties of RF reactively sputtered WO3 films[J]. Solid State Ionics, 2003, 165(1~4): 175~180

    [4] [4] Z. Dimitrova, D. Gogova. On the structure, stress and optical properties of CVD tungsten oxide films[J]. Materials Research Bulletin, 2005, 40(`2): 333~340

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Electrochromism of WO3 Films Deposited by Mid-Frequency Dual-Target Magnetron Sputtering Method[J]. Acta Optica Sinica, 2006, 26(6): 938

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    Paper Information

    Category: Thin Films

    Received: Jun. 2, 2005

    Accepted: --

    Published Online: Jun. 13, 2006

    The Author Email: (wlge80@163.com)

    DOI:

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