Acta Optica Sinica, Volume. 33, Issue 11, 1122002(2013)
Polarization Analysis of a Real High Numerical Aperture Optical LithographyLuo Hongmei
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Polarization Analysis of a Real High Numerical Aperture Optical LithographyLuo Hongmei[J]. Acta Optica Sinica, 2013, 33(11): 1122002
Category: Optical Design and Fabrication
Received: May. 31, 2013
Accepted: --
Published Online: Sep. 17, 2013
The Author Email: (lhmhit@yeah.net)