Chinese Optics Letters, Volume. 5, Issue 10, 602(2007)

Quantum simulation for peak broadening in atom lithography

Min Zhao*, Zhanshan Wang, Yan Ma, Bin Ma, and Fosheng Li
Author Affiliations
  • Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092
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    CLP Journals

    [1] Baowu Zhang, Tongbao Li, Yan Ma. One-dimensional Doppler laser collimation of chromium beam with a novel pre-collimating scheme[J]. Chinese Optics Letters, 2008, 6(10): 782

    [2] Zhang Baowu, Ma Yan, Li Tongbao, Zhang Wentao. Effect of Laser Power on One-Dimensional Deposition of Chromium Atomic Beam[J]. Acta Optica Sinica, 2009, 29(2): 421

    [3] Zhang Pingping, Ma Yan, Li Tongbao. Optimization of Particle Optics Model for One-Dimentional Atom Lithography[J]. Acta Optica Sinica, 2011, 31(5): 514004

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    Min Zhao, Zhanshan Wang, Yan Ma, Bin Ma, Fosheng Li. Quantum simulation for peak broadening in atom lithography[J]. Chinese Optics Letters, 2007, 5(10): 602

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    Paper Information

    Received: Apr. 23, 2007

    Accepted: --

    Published Online: Oct. 11, 2007

    The Author Email: Min Zhao (minminzhao@mail.tongji.edu.cn)

    DOI:

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