Optics and Precision Engineering, Volume. 31, Issue 14, 2071(2023)

Research on post-processing polishing technology of pulse compression gratings with high laser damage threshold

Xiaolan HONG and Chen JIANG*
Author Affiliations
  • School of Mechanical Engineering, University of Shanghai for Science and Technology, Shanghai200093,China
  • show less
    Figures & Tables(11)
    Fabrication process of multilayer dielectric pulse compression grating
    MCF polishing principle
    Comparison of grating depth curves
    Grating structure height data distribution
    3D morphology of grating before and after polishing measured by AFM
    Surface morphologies of unpolished and polished PCG by AFM
    Surface roughness of PCG before and after polishing
    -1st Diffraction Efficiencies (DE) of samples 1 and 2 before and after polishing
    Laser induced damage threshold before and after polishing.
    • Table 1. Composition of MCF polishing fluid

      View table
      View in Article

      Table 1. Composition of MCF polishing fluid

      成分羰基铁粉氧化铝Al2O3α-纤维素去离子水
      质量分数52%15%3%30%
      粒度20 nm20 nm//
    • Table 2. Parameters of MCF polishing experiment

      View table
      View in Article

      Table 2. Parameters of MCF polishing experiment

      工艺参数数值
      抛光转速/(r·min-1200
      抛光间隙/mm3
      抛光时间/min2
      磁场强度/T0.4
      磁铁尺寸(外径×内径×厚度)/(mm×mm×mm)30×20×7
      磁性复合流体质量/g40
    Tools

    Get Citation

    Copy Citation Text

    Xiaolan HONG, Chen JIANG. Research on post-processing polishing technology of pulse compression gratings with high laser damage threshold[J]. Optics and Precision Engineering, 2023, 31(14): 2071

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Micro/Nano Technology and Fine Mechanics

    Received: Feb. 20, 2023

    Accepted: --

    Published Online: Aug. 2, 2023

    The Author Email: JIANG Chen (jc_bati@163.com)

    DOI:10.37188/OPE.20233114.2071

    Topics