<trans-title>Ag Doped Amorphous Carbon Films: Structure, Mechanical and Electrical Behaviors</trans-title>

Ren-De CHEN; Peng GUO; Xiao ZUO; Shi-Peng XU; Pei-Ling KE; Ai-Ying WANG

doi:10.15541/jim20180263

Journal of Inorganic Materials, Volume. 34, Issue 4, 387(2019)

Ag Doped Amorphous Carbon Films: Structure, Mechanical and Electrical Behaviors

Ren-De CHEN1... Peng GUO1, Xiao ZUO1, Shi-Peng XU2, Pei-Ling KE1,3, and Ai-Ying WANG13,* |Show fewer author(s)

¹Zhejiang Key Laboratory of Marine Materials of Protective Technologies, Key Laboratory of Marine Materials and Related Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China

²Gansu Key Laboratory of Solar Power Generation System Project, Jiuquan Vocational and Technical College, Jiuquan 735000, China

³Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Figures & Tables(11)

1. Typical XPS spectra for the a-C:Ag films (a), and representative Ag 3d spectra of the films with 41.4at% Ag (b)

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2. XRD patterns of a-C:Ag films with various Ag concentrations

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3. (a) Sample for TEM prepared by FIB, (b) HRTEM and SAED of sample with 1.2at% a-C:Ag

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4. Typical Raman spectra a-C:Ag films with different Ag concentrations (a) and the fitting result of a-C:Ag film with 0.7at% Ag atoms (b)

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5. Surface topographies of a-C:Ag films with different Ag concentrations

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6. Hardness (a) and elastic modulus (b) as a function of Ag concentration

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7. Residual compressive stress of a-C:Ag films as a function of Ag concentration

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8. Temperature dependence of resistivity in a-C:Ag film with 37.8at% Ag in the range of 8~400 K (a) and the a-C:Ag with 41.4at% Ag in the range of 2~400 K (b)

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9. Plot of lnρ vs reciprocal temperature in the range of 164-400 K for a-C:Ag film with 41.4at% Ag

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Table 1. Ag concentration, O concentration, film thickness and average deposition rate varied with sputtering current and power

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Table 1. Ag concentration, O concentration, film thickness and average deposition rate varied with sputtering current and power

Sputtering current/A	Sputtering power/W	Ag concentration/at%	O concentration/at%	Thickness/nm	Deposition rate/(nm•min^-1)
1.3	582	0.7	30.2	364.5	18.2
1.4	602	0.8	26.5	358.3	17.9
1.5	647	1.2	27.2	508.5	25.4
1.6	859	13.0	45.2	725.4	36.3
1.8	788	37.8	32.9	1409.1	70.5
2.0	856	41.4	32.2	1720.4	86.0

Table 2. The fitted G-peak position, I_D/I_G and FWHM of G-peak varied with different Ag concentrations
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Table 2. The fitted G-peak position, I_D/I_G and FWHM of G-peak varied with different Ag concentrations
Ag concentration/at% G-peakposition/cm^-1 I_D/I_G FWHM of G-peak/cm^-1
0.7 1533.0 0.75 159.4
0.8 1535.9 0.79 151.6
1.2 1539.8 0.85 151.4
13.0 1582.5 1.94 122.5
37.8 1566.4 2.15 123.6
41.4 1580.7 2.68 110.0

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Ren-De CHEN, Peng GUO, Xiao ZUO, Shi-Peng XU, Pei-Ling KE, Ai-Ying WANG. Ag Doped Amorphous Carbon Films: Structure, Mechanical and Electrical Behaviors[J]. Journal of Inorganic Materials, 2019, 34(4): 387

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Paper Information

Category: RESEARCH PAPER

Received: Jun. 19, 2018

Accepted: --

Published Online: Sep. 24, 2021

The Author Email: WANG Ai-Ying (aywang@nimte.ac.cn)

DOI:10.15541/jim20180263

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. Ag concentration, O concentration, film thickness and average deposition rate varied with sputtering current and power

Table 1. Ag concentration, O concentration, film thickness and average deposition rate varied with sputtering current and power

Table 2. The fitted G-peak position, ID/IG and FWHM of G-peak varied with different Ag concentrations

Table 2. The fitted G-peak position, ID/IG and FWHM of G-peak varied with different Ag concentrations

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Table 2. The fitted G-peak position, I_D/I_G and FWHM of G-peak varied with different Ag concentrations

Table 2. The fitted G-peak position, I_D/I_G and FWHM of G-peak varied with different Ag concentrations