Fig. 1. Schematic diagram of the classification of stealth technologies^[6-7]

Fig. 2. Infrared stealth studies based on temperature modulation. (a) Structured thermal surfaces^[12]; (b), (c) Visual obfuscation of virtual targets^[13-14]; (d) Stealth cloak^[15]; (e) Far-infrared unidirectional stealth cloak^[16]; (f) Infrared stealth based on thermally insulating materials^[17]

Fig. 3. Infrared stealth research based on photonic crystal structures. (a) Ge/ZnS photonic crystals^[21]; (b) Ge, ZnSe, Si photonic crystals^[22]; (c) SiO₂, TiO₂, Ge alternating multilayer structures^[23]; (d) Ge/ZnS photonic crystal structures^[24]; (e) Multispectral compatible photonic crystal structures^[25]

Fig. 4. Infrared stealth research based on F-P cavity structures. (a) Infrared stealth selective emitter with Ag/Ge multilayer films ^[27]; (b) Composite four-layer structure with transparent conductive films of indium tin oxide and dielectric films of zinc sulfide ^[28]; (c) Alternating four-layer structure with photoresist and indium tin oxide ^[29]; (d) Si₃N₄-TiN-MgO-TiN four-layer structures^[30]

Fig. 5. Infrared stealth research based on metasurface structures. (a) Metasurface stealth carpet^[53]; (b) Disc metasurface ^[54]; (c) Circular metasurface^[55]; (d) Metasurface compatible with IR and microwave stealth^[56]; (e) Metasurface compatible with visible, infrared, and laser stealth^[57]

Fig. 6. Comparison of three basic structures for multi-band infrared stealth^[24-57]

Fig. 7. Examples of combined phase change materials for dynamic modulation of stealth materials applications. (a) VO₂, graphene, and carbon nanotube trilayer structure stealth device^[77]; (b) Multilayer cavity-coupled IR absorber^[78]; (c) Thin film structure of tungsten-doped vanadium dioxide^[79]; (d) GST-Au two-layer structure^[80]

Fig. 8. (a) Complex pattern processed by 3D laser direct writing technology; (b) UV continuous frequency lithography optical path^[89]; (c) 300 mm stencil prepared by EVG 770NT; (d) GL SR300300 mm large area master stencil^[90]

Fig. 9. Examples of nanoimprinting technique studies. (a) Grating with a width of 100 nm embossed by step flash embossing technique^[93]; (b) UV-SCIL plate embossing^[94]; (c) Sub-10 nm resolution achieved on wafer-level area^[95]

Fig. 10. Roll-to-roll embossing technology. (a) Roll-to-roll embossing technology^[96]; (b) Roll-to-flat embossing technology^[97]