Opto-Electronic Engineering, Volume. 31, Issue z1, 67(2004)
Uniformity of optical film prepared by ion beam sputtering
[2] [2] DEMIRYONT H ,SITES J R ,GEIB K .Effects of oxygen content on the properties of tantalum oxide films deposited by ion beam sputtering [J]. Appl, Opt, 1985, 24: 490-495.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Uniformity of optical film prepared by ion beam sputtering[J]. Opto-Electronic Engineering, 2004, 31(z1): 67