Opto-Electronic Engineering, Volume. 31, Issue z1, 67(2004)

Uniformity of optical film prepared by ion beam sputtering

[in Chinese]1... [in Chinese]1, [in Chinese]1, [in Chinese]1,2 and [in Chinese]1 |Show fewer author(s)
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    References(1)

    [2] [2] DEMIRYONT H ,SITES J R ,GEIB K .Effects of oxygen content on the properties of tantalum oxide films deposited by ion beam sputtering [J]. Appl, Opt, 1985, 24: 490-495.

    CLP Journals

    [1] FENG Shi, FU Xiu-hua, WANG Da-sen, LI Xiao-jing, NIE Feng-ming, ZHANG Xu. Study on Planarization Layer Uniformity of Large-aperture Optical Elements Based on Ion Beam Sputtering[J]. Acta Photonica Sinica, 2019, 48(1): 131002

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Uniformity of optical film prepared by ion beam sputtering[J]. Opto-Electronic Engineering, 2004, 31(z1): 67

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    Received: Apr. 22, 2004

    Accepted: --

    Published Online: Nov. 14, 2007

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