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Journal of Applied Optics, Volume. 40, Issue 4, 575(2019)

Optimization of polarization aberration for NA1.35 lithographic projection optical system

LI Jie1...2, LIN Wumei1 and LIAO Zhijie1 |Show fewer author(s)
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  • 2[in Chinese]
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    LI Jie, LIN Wumei, LIAO Zhijie. Optimization of polarization aberration for NA1.35 lithographic projection optical system[J]. Journal of Applied Optics, 2019, 40(4): 575

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    Received: Jan. 21, 2019

    Accepted: --

    Published Online: Nov. 5, 2019

    The Author Email:

    DOI:10.5768/jao201940.0401008

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology