Chinese Journal of Quantum Electronics, Volume. 41, Issue 4, 671(2024)

Investigation of deep‑level defects in wurtzite GaAs nanowire

QIAO Xumian... LI Xinhua, GU Maomao, GONG Shulei, GONG Ziyan, WU Chaoke, WU Chao and ZHAO Leiming |Show fewer author(s)
Author Affiliations
  • Key Laboratory of Advanced Electronic Materials and Devices, Anhui Jianzhu University, Hefei 230601, China
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    Figures & Tables(5)
    TEM image (a), high-resolution morphology (b), and diffraction pattern (c) of GaAs Nanowire
    (a) SEM morphology of GaAs NWs devices with two metal electrode terminals;(b) Typical photoconductance transient change of GaAs NWs
    Decay of the PPC at four representative temperature. [The hollow dots represent experimental data, and the continuous solid lines are the fitting results of the photocurrent attenuation using equation (1) ]
    Carrier dynamics model used to determine the dependence of defect concentration on illumination intensity
    Normalized photoionization cross-section variation with photon energy
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    Xumian QIAO, Xinhua LI, Maomao GU, Shulei GONG, Ziyan GONG, Chaoke WU, Chao WU, Leiming ZHAO. Investigation of deep‑level defects in wurtzite GaAs nanowire[J]. Chinese Journal of Quantum Electronics, 2024, 41(4): 671

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    Paper Information

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    Received: Mar. 30, 2023

    Accepted: --

    Published Online: Jan. 8, 2025

    The Author Email:

    DOI:10.3969/j.issn.1007-5461.2024.04.011

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