Acta Optica Sinica, Volume. 32, Issue 1, 112003(2012)
Location Error Compensation Algorithm for Measuring Optical System Wave Front by Sub-Aperture Stitching
[1] [1] C. J. Kim. Polynomial fit of interferograms [J]. Appl. Opt., 1982, 21(24): 4521~4525
[2] [2] M.Bray. Stitching interferometry: how and why it works[C]. SPIE, 1999, 3739: 259~268
[3] [3] J. Fleig, P. dumas, et al.. An automated subaperture stitching workstation for spherical and aspherical surface[C]. SPIE, 2003, 5188: 296~307
[4] [4] Donald Golini, Greg Forbes, Paul Murphy. Method for self-calibrated subaperture stitching for surface figure measurement [P]. US Patent: 6956657B 2005
[5] [5] Julius Yellowhair, Peng Su, Matt Novak et al.. Fabrication and testing of large flats [C]. SPIE, 2007, 6671: 667107
[7] [7] Wang Lihua, Yang Wei, Li Lei et al.. Sub-aperture stitching with scanning pentaprism testing optical wavefront[C]. SPIE, 2010, 7654: 76540Y
[8] [8] Zhang Rongzhu, Shi Qikai, Cai Bangwei et al.. Study on the experiments of the stitching interferometer[J]. Optical Technique, 2004, 30(2): 173~175
[9] [9] Xu Hongyan, Xian Hao, Zhang Yudong. Algorithm for reconstructing the whole-aperture wavefront from annular subaperture Hartmann gradient data[J]. Acta Optica Sinica, 2011, 31(1): 0112005
Get Citation
Copy Citation Text
Wang Lihua, Wu Shibin, Ren Ge, Tan Yi, Yang Wei. Location Error Compensation Algorithm for Measuring Optical System Wave Front by Sub-Aperture Stitching[J]. Acta Optica Sinica, 2012, 32(1): 112003
Category: Instrumentation, Measurement and Metrology
Received: Jun. 22, 2011
Accepted: --
Published Online: Jan. 4, 2012
The Author Email: Lihua Wang (lhwangky@163.com)