Optics and Precision Engineering, Volume. 23, Issue 1, 149(2015)
Suppression of collapse and adhesion of photoresist based on microwave heating
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YU Ming-yan, SHI Yun-bo, ZHAO Shi-rui, GUO Xiao-long, XU Xin-wei, JING Yu-peng, CHEN Bao-qin. Suppression of collapse and adhesion of photoresist based on microwave heating[J]. Optics and Precision Engineering, 2015, 23(1): 149
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Received: Jun. 5, 2014
Accepted: --
Published Online: Feb. 15, 2015
The Author Email: Ming-yan YU (yumingyan@ime.ac.cn)
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