Optics and Precision Engineering, Volume. 23, Issue 1, 149(2015)

Suppression of collapse and adhesion of photoresist based on microwave heating

YU Ming-yan1...2,*, SHI Yun-bo2, ZHAO Shi-rui1, GUO Xiao-long1, XU Xin-wei1, JING Yu-peng1 and CHEN Bao-qin1 |Show fewer author(s)
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    YU Ming-yan, SHI Yun-bo, ZHAO Shi-rui, GUO Xiao-long, XU Xin-wei, JING Yu-peng, CHEN Bao-qin. Suppression of collapse and adhesion of photoresist based on microwave heating[J]. Optics and Precision Engineering, 2015, 23(1): 149

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    Paper Information

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    Received: Jun. 5, 2014

    Accepted: --

    Published Online: Feb. 15, 2015

    The Author Email: Ming-yan YU (yumingyan@ime.ac.cn)

    DOI:10.3788/ope.20152301.0149

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