Laser & Optoelectronics Progress, Volume. 55, Issue 6, 061203(2018)
Design of Multi-Point Real-Time Lithography Light Source Uniformity Detection System
Fig. 1. System structure of the illuminance uniformity detection equipment
Fig. 2. Picture of illuminance uniformity detection equipment
Fig. 3. Improved current-voltage amplifying circuit
Fig. 4. Positions of the detector units placed
Fig. 5. Picture of exposure machine illumination uniformity test
Fig. 6. Photoelectric characteristic calibration curve of detector unit
Fig. 7. Calibration curves of photoelectric characteristic of the detector unit after correction
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Kewei Zhao, Aiying Tan, Shaoyun Yin, Wentao Cai, Ruofu Yang, Jianjun Chen, Shoufeng Tong. Design of Multi-Point Real-Time Lithography Light Source Uniformity Detection System[J]. Laser & Optoelectronics Progress, 2018, 55(6): 061203
Category: Instrumentation, Measurement and Metrology
Received: Nov. 16, 2017
Accepted: --
Published Online: Sep. 11, 2018
The Author Email: Yang Ruofu ( yangruofu@cigit.ac.cn)