In order to improve the efficiency of transdermal drug dilivery and reduce the pain of traditional injection on the human body, the microneedle array is needed. In this paper, the fabrication technique for microneedle array was introduced. A microneedle array was obtained on a polymethylmethacrylate (PMMA) substrate by using two moving X-ray lithography and alignment X-ray exposure process using the synchrotron radiation source AURORA of Japanese Ritsumeikan University. A hollow microneedle array was fabricated. The different specifications had been successfully fabricated by using different mask pattern and X-ray lithography for different hollow positions. X-ray lithography alignment device had been developed for the problem of alignment during fixed X-ray lithography. The experimental results show that the device could achieve the preparation of hollow microneedle array. Then, the piercing text was carried out, and the results showed that the microneedle had enough strength. Besides, in order to achieve the goal of low cost batch replication of microneedle array, the reverse mold and replication experiments of microneedle array were also carried out, and the Ni solid microneedle array was successfully manufactured. Finally, in view of the distortion of the side shape of the microneedle array structure during the process of X-ray lithography, the simulation prediction was established for the moving X-ray lithography, the simulation prediction results were compared with the experimental results. The results showed that the simulation error of developing depth was 5%.