Acta Photonica Sinica, Volume. 36, Issue 9, 1683(2007)
Influence of Two Post-treatment Methods on Properties of HfO2 Thin Films
[1] [1] FADEL M,AZIMM O A,OMER O A,et al.A study of some optical properties of hafnium dioxide (HfO2) thin films and their applications[J].Applied Physics A,Materials Science & Processing,1998,66:335-343.
[2] [2] ALVISI M,GIULIO M Di,MARRONES G,et al.HfO2 films with high laser damage threshold[J].Thin Solid Films,2000,358:250-258.
[4] [4] GU Pei-fu.Thin films technology[M].Zhejiang University Press,1990:76,182.
[5] [5] KONG W J,SHEN J,SHEN Z C,et al.Multi-layer dielectric film for pulse compressed gratings[J].Acta Photonica Sinica,2006,35(1):84-88.
[6] [6] ZHANG D P,SHAO J D,ZHANG D W,et al.Employing oxygen-plasma posttreatment to improve the laser-induced damage threshold of ZrO2 films prepared by the electron-beam evaporation method[J].Optics Letters,2004,29 (24):2870.
[7] [7] WU Z L,KUO P K.Laser-induced surface thermal lensing for thin film characterizations[C].SPIE.2714,294-304.
[8] [8] SHANG G Q,ZHANG M Q,HE H B.et al.Fabrication and properties of third harmonic beam splitter[J].High Power Laser and Particle Beams,2006,18 (4):580-582.
[9] [9] PICARD R,MILAM D,BRADBURY R.Appl Opt,1977,(16):1563-1571.
[10] [10] DIJON J,POIROUX T,DESRUMAUX C.Laser-induced damage in optical in materials[C].SPIE,1996,2966,3156-3166.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Influence of Two Post-treatment Methods on Properties of HfO2 Thin Films[J]. Acta Photonica Sinica, 2007, 36(9): 1683