Fig. 1. CLIP工艺中阻聚区形成原理示意图Schematic diagram for the principle of oxygen inhibition layer formation in CLIP process

Fig. 2. 计算模型Numerical calculation model

Fig. 3. 不同形状微孔的约束基底的透光率Light transmittance of constraint substrate formed micro-pores with different shapes

Fig. 4. 微孔尺寸及周期对不同波长光在固化区光强分布均匀性的影响Effect of the size and period of micro-pores on light intensity distribution uniformity with different wavelength in curing zone

Fig. 5. 不同孔径微孔基底条件下405 nm UV光源在固化区的光强分布特征Light intensity distribution characteristics of 405 nm UV light in curing zone with different size micro-pores

Fig. 6. 约束面投影光固化成型装置Setup of constrained-surface projection-based stereolithography

Fig. 7. 通过激光加工在石英玻璃基底上制备的微孔阵列Micro-pore array on quartz substrate fabricated through laser etching

Fig. 8. 微孔固化成型图案共聚焦显微镜表征结果Cured pattern characterization result of micro-pore through confocal interferometric microscope