Acta Physica Sinica, Volume. 69, Issue 7, 076801-1(2020)

Atomic simulation of SiyHx structure configuration in a-Si:H thin films

Shi-Ming Zhai, Huang-Sheng Liao, Nai-Gen Zhou*, Hai-Bin Huang*, and Lang Zhou
Author Affiliations
  • School of Materials Science and Engineering, Institute of Photovoltaics, Nanchang University, Nanchang 330031, China
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    References(22)

    [19] Hafner J, Kresse G[J]. Properties of Complex Inorganic Solids, 69-99(1997).

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    Shi-Ming Zhai, Huang-Sheng Liao, Nai-Gen Zhou, Hai-Bin Huang, Lang Zhou. Atomic simulation of SiyHx structure configuration in a-Si:H thin films [J]. Acta Physica Sinica, 2020, 69(7): 076801-1

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    Paper Information

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    Received: Aug. 22, 2019

    Accepted: --

    Published Online: Nov. 20, 2020

    The Author Email: Huang Hai-Bin (haibinhuang@ncu.edu.cn)

    DOI:10.7498/aps.69.20191275

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