Acta Photonica Sinica, Volume. 50, Issue 6, 129(2021)
Short-pulse Laser-induced Plasma Micro-etching of High-temperature and High Pressure Single Crystal Diamond
Figures & Tables(7)
Fig. 1. Schematic diagram of LIPAA principle and experimental device
Fig. 3. Measuring the temperature field of laser-induced plasma-assisted etching of diamond surface
Fig. 4. SEM topography and surface products of diamond microstructure
Fig. 5. The relationship between processing parameters and microstructure size during laser-induced copper target processing with low repetition frequency and 5 ns pulse width
Fig. 6. Scanning electron microscope and three-dimensional video optical microscope to observe the groove morphology of laser-induced plasma etching with different pulse widths
Table 1. Optics source of short-pulse infrared laser induced plasma micro-etching single crystal diamond
View tableView in ArticleTable 1. Optics source of short-pulse infrared laser induced plasma micro-etching single crystal diamond
Laser type Pulse duration/ns Repetition rate/kHz Diameters/μm Power/W Producer YLPR-0.3-A1-60-18 1~10 60~300 20 18 IPG YDFLP-20-M1+-S 1~200 45~1 600 20 20 JPT opto-electronics PicoYL-40-600-20 0.6~4 100~5 000 20 18 Yangtze Soton Laser
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Xizhao LU, Jialin CHEN, Qiuling WEN, Jing LU, Feng JIANG. Short-pulse Laser-induced Plasma Micro-etching of High-temperature and High Pressure Single Crystal Diamond[J]. Acta Photonica Sinica, 2021, 50(6): 129
Paper Information
Category: Special Issue for Ultrafast Laser Precision Machining of Hard and Brittle Materials
Received: Apr. 19, 2021
Accepted: May. 21, 2021
Published Online: Aug. 31, 2021
The Author Email: JIANG Feng (jiangfeng@hqu.edu.cn)
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