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Chinese Journal of Quantum Electronics, Volume. 36, Issue 2, 219(2019)

Crystallization of amorphous silicon films annealed by line shape excimer laser beam

Guangyue YIN1...2,*, Libing YOU1, Xing CHEN1,2, Jingzhen SHAO1, Liang CHEN1,2, Qingsheng WANG1, and Xiaodong FANG12 |Show fewer author(s)
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    YIN Guangyue, YOU Libing, CHEN Xing, SHAO Jingzhen, CHEN Liang, WANG Qingsheng, FANG Xiaodong. Crystallization of amorphous silicon films annealed by line shape excimer laser beam[J]. Chinese Journal of Quantum Electronics, 2019, 36(2): 219

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    Received: --

    Accepted: --

    Published Online: Apr. 3, 2019

    The Author Email: Guangyue YIN (378575080@qq.com)

    DOI:10.3969/j.issn.1007-5461. 2019.02.014

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology