Chinese Optics Letters, Volume. 4, Issue 10, 611(2006)

B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]2, and [in Chinese]2
Author Affiliations
  • 1Institute of Precision Optical Engineering, Physics Department, Tongji University, Shanghai 200092
  • 2National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029
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    References(12)

    [1] [1] M. F. Ravet, F. Bridou, X. Zhang-Song, A. Jerome, F. Delmotte, R. Mercier, M. Bougnet, P. Bouyries, and J. P. Delaboudiniere, Proc. SPIE 5250, 99 (2004).

    [2] [2] J. Gautier, F. Delmotte, M. Roulliay, F. Bridou, M.-F. Ravet, and A. Jeome, Appl. Opt. 44, 384 (2005).

    [3] [3] D. L. Windt, S. Donguy, J. Seely, B. Kjornrattanawanich, E. M. Gullikson, C. C. Walton, L. Golub, and E. DeLuca, Proc. SPIE 5168, 1 (2004).

    [4] [4] M. Grigonis and E. J. Knystautas, Appl. Opt. 36, 2839 (1997).

    [5] [5] P. Boher, L. Hennet, and Ph. Houdy, Proc. SPIE 1345, 198 (1990).

    [6] [6] J. I. Larruquert, J. Opt. Soc. Am. A 18, 1406 (2001).

    [7] [7] J. I. Larruquert, J. Opt. Soc. Am. A 19, 385 (2002).

    [8] [8] J. I. Larruquert, Opt. Soc. Am. A 19, 391 (2002).

    [9] [9] http://www.cxro.lbl.gov/.

    CLP Journals

    [1] Junling Qin, Jianda Shao, Kui Yi, Zhengxiu Fan. Interface roughness, surface roughness and soft X-ray reflectivity of Mo/Si multilayers with different layer number[J]. Chinese Optics Letters, 2007, 5(5): 301

    [2] Moyan Tan, Haochuan Li, Qiushi Huang, Hongjun Zhou, Tonglin Huo, Xiaoqiang Wang, Jingtao Zhu. Mo/Si aperiodic multilayer broadband reflective mirror for 12.5–28.5-nm wavelength range[J]. Chinese Optics Letters, 2011, 9(2): 023102

    [3] Liqin Liu, Zhanshan Wang, Jingtao Zhu, Zhong Zhang, Moyan Tan, Qiushi Huang, Rui Chen, Jing Xu, Lingyan Chen. Intrinsic stress analysis of sputtered carbon film[J]. Chinese Optics Letters, 2008, 6(5): 384

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. B4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm[J]. Chinese Optics Letters, 2006, 4(10): 611

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    Paper Information

    Received: May. 29, 2006

    Accepted: --

    Published Online: Oct. 31, 2006

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