Optics and Precision Engineering, Volume. 29, Issue 9, 2108(2021)

Verification of redeposition correction in focused ion beam milling by cellular automaton

Jie CHEN1,*... Bang-jun MA1, Xiao-long WANG1, Tian HAN2 and Jun-sheng LIAO1 |Show fewer author(s)
Author Affiliations
  • 1Institute of Materials, China Academy of Engineering Physics, Mianyang62908, China
  • 2College of Mechanical Engineering, Southeast University, Nanjing11189, China
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    Figures & Tables(10)
    Schematic of ion sputtering where S1,S2 correspond to areas of redeposition region A1,A2, respectively
    Effect of dose of ions on sidewall tilt
    Effect of dwell time on redeposition distribution
    Schematic of traditional sputtering and SLAS path
    Principle schematic of SLAS
    Evolution of redeposition process
    Evolution of trench section in simulation of SLAS
    Schematic of sidewall sections before and after SLAS correction
    Evolution of trenches upon gradual approaching of single-pixel lines to central area
    Fresnel zone plate fabricated by SLAS-mediated FIB
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    Jie CHEN, Bang-jun MA, Xiao-long WANG, Tian HAN, Jun-sheng LIAO. Verification of redeposition correction in focused ion beam milling by cellular automaton[J]. Optics and Precision Engineering, 2021, 29(9): 2108

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    Paper Information

    Category: Micro/Nano Technology and Fine Mechanics

    Received: Nov. 13, 2020

    Accepted: --

    Published Online: Nov. 22, 2021

    The Author Email: CHEN Jie (13981116015@163.com)

    DOI:10.37188/OPE.20212909.2108

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