Research and Progress of Computational Lithography

Xu Ma; Sheng’en Zhang; Yihua Pan; Junbi Zhang; Chengzhen Yu; Lisong Dong; Yayi Wei

doi:10.3788/LOP202259.0922008

Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922008(2022)

Research and Progress of Computational Lithography

Xu Ma^1、*, Sheng’en Zhang¹, Yihua Pan¹, Junbi Zhang¹, Chengzhen Yu¹, Lisong Dong^2,3, and Yayi Wei^2,3、**

¹Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

²Integrated Circuit Advanced Process R&D Center, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China

³School of Microelectronics, University of Chinese Academy of Sciences, Beijing 100049, China

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Xu Ma, Sheng’en Zhang, Yihua Pan, Junbi Zhang, Chengzhen Yu, Lisong Dong, Yayi Wei. Research and Progress of Computational Lithography[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922008

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Paper Information

Category: Optical Design and Fabrication

Received: Jan. 6, 2022

Accepted: Feb. 25, 2022

Published Online: May. 10, 2022

The Author Email: Ma Xu (maxu@bit.edu.cn), Wei Yayi (weiyayi@ime.ac.cn)

DOI:10.3788/LOP202259.0922008

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology