Acta Physica Sinica, Volume. 69, Issue 10, 107202-1(2020)
Fig. 1. The schematic diagram of the FCVA deposition system.
Fig. 2. Distribution of the layers in the coating.
Fig. 3. Thecrosssection of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2:(a) 0 sccm; (b) 10 sccm; (c) 15 sccm
Fig. 4. XRD diffractogram of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 5. Raman spectra of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 6. XPS analysis of S3: (a) N 1s;(b) C 1s;(c) Ti 2p; (d) Al 2p.
Fig. 7. Potentiodynamic polarization curves of TiAlCN/TiAlN/TiAl coatings in 3.5 wt-% NaCl solution.
Fig. 8. Results of Electrochemical corrosion characterization activities for TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 9. Electrochemical impedance spectroscopy of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 10. Bode plots ofTiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 11. Bode phase angle plots ofTiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 12. SEM surface micrographs of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2: (a)0 sccm; (b)10 sccm; (c)15 sccm.
Fig. 13. Friction coefficient curves of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 14. Friction coefficientand wear rate of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Fig. 15. SEM micrographs of the wear track and EDS results of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2: (a), (b) 0 sccm; (c), (d) 10 sccm; (e), (f) 15 sccm.
Fig. 16. Raman spectra of wear track of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
Chemical composition of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
不同C2H2流量沉积的TiAlCN/TiAlN/TiAl涂层的元素相对含量
Chemical composition of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
不同C2H2流量沉积的TiAlCN/TiAlN/TiAl涂层的元素相对含量
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Microhardness、Modules and ratio of H/E of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
不同C2H2流量沉积的TiAlCN/TiAlN/TiAl涂层的显微硬度、杨氏模量和H/E比值
Microhardness、Modules and ratio of H/E of TiAlCN/TiAlN/TiAl coatings deposited at various C2H2.
不同C2H2流量沉积的TiAlCN/TiAlN/TiAl涂层的显微硬度、杨氏模量和H/E比值
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Shu-Nian Chen, Bin Liao, Lin Chen, Zhi-Qiang Zhang, Yong-Qing Shen, Hao-Qi Wang, Pan Pang, Xian-Ying Wu, Qing-Song Hua, Guang-Yu He.
Received: Jan. 3, 2020
Accepted: --
Published Online: Nov. 30, 2020
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