Acta Optica Sinica, Volume. 33, Issue 10, 1034002(2013)
Integrated Development of Extreme Ultraviolet Lithography Mask at 32 nm Node
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Du Yuchan, Li Hailiang, Shi Lina, Li Chun, Xie Changqing. Integrated Development of Extreme Ultraviolet Lithography Mask at 32 nm Node[J]. Acta Optica Sinica, 2013, 33(10): 1034002
Paper Information
Category: X-Ray Optics
Received: Apr. 16, 2013
Accepted: --
Published Online: Sep. 25, 2013
The Author Email: Yuchan Du (dyc0927@163.com)
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