[1] [1] Schoenbach K H, Shi W, Ciocca M, et al. Plasma Sources Sci. Technol., 1997, 6: 468.

[2] [2] Dhali S K, Sardja I. J. Appl. Phys., 1991, 69: 6319.

[3] [3] Boeuf J P. J. Phys. D: Appl. Phys., 2003, 36: R53.

[4] [4] Heise M, Neff W, Franken O, et al. Plasmas and Polymers, 2004, 9: 23.

[5] [5] Karanassios V. Spectrochim. Acta Part B, 2004, 59: 909.

[6] [6] Kim J, Terashima K. Appl. Phys. Lett., 2005, 86: 191504.

[7] [7] Koo I G, Cho J H, Choi M Y, et al. Appl. Phys. Lett., 2007, 91: 041502.

[8] [8] Kim Jaeho, Katsurai Makoto, Kim Dongmin, et al. Appl. Phys. Lett., 2008, 93: 191505.

[9] [9] Masoud N, Martus K, Figus M, et al. Contrib. Plasma Phys., 2005, 45(1): 30.

[10] [10] Yalin A P, Yu Z Q, Stan O, et al. Appl. Phys. Lett., 2003, 83: 2766.

[12] [12] Kozlov K V, Brandenburg R, Michel P, et al. J. Phys. D: Appl. Phys., 2001, 34: 3164.