Acta Optica Sinica, Volume. 30, Issue 5, 1451(2010)
Fabrication of High Aspect Ratio Sub-micron Gratings on PMMA Plate Based on Synchrony Radiation Lithography
[1] [1] J. Zhao,A. Wang. Abbaspour-Sani E. et al.. Improved efficiency silicon solar cell module[J]. IEEE Electr. Device L.,1997,18(2):48-50
[2] [2] J. Zhao,M. A. Green. Optimized antireflection coatings for high-efficiency silicon solar cells[J]. IEEE T. Electron Dev.,1991,38(8):1925-1934
[3] [3] P. Nubile,Analytical design of antireflection coatings for silicon photovoltaic devices[J]. Thin Solid Films,1999,342(1,2):257-261
[4] [4] P. Lalanne,G. M. Morris. Design,fabrication,and character-ization of subwavelength periodic structures for simiconductor antireflection coating in the visible domain[C]. SPIE,1996,2776:300-309
[5] [5] M. A. Green,A. W. Blakers,J Zhao. et al.. Characterization of 23-percent efficient silicon solar cells[J]. IEEE T. Electron Dev.,1990,37(2):331-336
[6] [6] Y. Toma,M. Hatakeyama,K Ichiki. et al.. Fast atom beam etching of glass materials with contact and non-contact masks [J]. Jpn. J. Appl. Phys.,1997,36(12B):7655-7659
[7] [7] W. Ehrfeld,H. Lehr. Deep X-ray lithography for the production of 3D microstructures [J]. Radiat. Phys. Chem.,1995,45(3):349-365
[8] [8] Li Yigui,Sugiyama Susumu. Fabrication of microgratings on PMMA plate and curved surface by using copper mesh as X-ray lithography mask[J]. Microsystem Technologies,2007,13(3-4):227-230
[9] [9] Li Yigui,Sugiyama Susumu. Sub-wavelength gratings base on X-ray lithography[J]. Nanotechnology and Precision Engineering,2007,5(4):249-252
[10] [10] Li Yigui,Sugiyama Susumu. Sub-wavelength anti-reflection gratings base on X-ray lithography[J]. Microfabrication Technology,2008,(1):14-16
[12] [12] Ye yan,Pu Donglin,Zhou Yun et al.. Research on transmission diffraction characteristics of sub- micron gratings for light guide plate[J]. Laser Journal,2007,28(5):55-56
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Li Yigui, Sugiyama Susumu. Fabrication of High Aspect Ratio Sub-micron Gratings on PMMA Plate Based on Synchrony Radiation Lithography[J]. Acta Optica Sinica, 2010, 30(5): 1451
Category: Optical Design and Fabrication
Received: Aug. 2, 2009
Accepted: --
Published Online: May. 11, 2010
The Author Email: Yigui Li (ygli@sjtu.edu.cn)