Acta Optica Sinica, Volume. 30, Issue 5, 1451(2010)

Fabrication of High Aspect Ratio Sub-micron Gratings on PMMA Plate Based on Synchrony Radiation Lithography

Li Yigui1、* and Sugiyama Susumu1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    [8] [8] Li Yigui,Sugiyama Susumu. Fabrication of microgratings on PMMA plate and curved surface by using copper mesh as X-ray lithography mask[J]. Microsystem Technologies,2007,13(3-4):227-230

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    Li Yigui, Sugiyama Susumu. Fabrication of High Aspect Ratio Sub-micron Gratings on PMMA Plate Based on Synchrony Radiation Lithography[J]. Acta Optica Sinica, 2010, 30(5): 1451

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Aug. 2, 2009

    Accepted: --

    Published Online: May. 11, 2010

    The Author Email: Yigui Li (ygli@sjtu.edu.cn)

    DOI:10.3788/aos20103005.1451

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