Acta Optica Sinica, Volume. 30, Issue 5, 1451(2010)
Fabrication of High Aspect Ratio Sub-micron Gratings on PMMA Plate Based on Synchrony Radiation Lithography
In order to increase the sensitivity of surface plasmon resonance sensors through planar metallic film closely coupled to nano- gratings and use grating period to adjust the wavelength of resonance reflection,sub-micron gratings is needed. The fabrication technique for sub-micro gratings structure is introduced. The sub-micron gratings are fabricated by synchrotron radiation (SR) lithography with SR source at Ritsumeikan University,Japan,and polymethylmethacrylate (PMMA) is used as X-ray resist. The 250 nm-width with 500 nm period pattern is successfully fabricated. The sub-micron grating with the aspect ratio of 8 is achieved. The lithography parameters such as proximity gap of exposure,the exposure dosage,and the development time influencing the structure are optimized to fabricate the gratings.
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Li Yigui, Sugiyama Susumu. Fabrication of High Aspect Ratio Sub-micron Gratings on PMMA Plate Based on Synchrony Radiation Lithography[J]. Acta Optica Sinica, 2010, 30(5): 1451
Category: Optical Design and Fabrication
Received: Aug. 2, 2009
Accepted: --
Published Online: May. 11, 2010
The Author Email: Yigui Li (ygli@sjtu.edu.cn)