Acta Optica Sinica, Volume. 24, Issue 3, 423(2004)

Deflecting System and Moving Objective Lens in Electron Beam Exposure Machine

[in Chinese]* and [in Chinese]
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  • [in Chinese]
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    References(2)

    [2] [2] Pfeiffer H C. Projection reduction exposure variable axis immersion lenses:next generation lithography. Vac. Sci. Technol., 1999, B17(11/12):2566~2576

    [4] [4] Dewolf P, Brazel E. Electrical testing application for scanning probe microscopes. Solid State Technol., 2000, 38(9):117~125

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    [in Chinese], [in Chinese]. Deflecting System and Moving Objective Lens in Electron Beam Exposure Machine[J]. Acta Optica Sinica, 2004, 24(3): 423

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    Paper Information

    Category: Physical Optics

    Received: Dec. 23, 2002

    Accepted: --

    Published Online: Jun. 12, 2006

    The Author Email: (sdyinming@sohu.com)

    DOI:

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