Chinese Journal of Quantum Electronics, Volume. 22, Issue 6, 923(2005)

Study of GaAs/Si/AlAs by DLTS technique

[in Chinese]1、*, [in Chinese]2, and [in Chinese]3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    References(8)

    [1] [1] Peressi M, Baroni S, Raffaece Resta. Tuning band offsets at semiconductor interfaces by intralayer deposition [J].Phys. Rev. B, 1991, 43(9): 7347-7350.

    [2] [2] Miwa R. H., Ferraz A. C.. Tuning band offsets at the AlAs/GaAs interface by group-Ⅳ intralayer deposition [J].Phys. Rev. B, 1998, 59(19):12499-12504.

    [3] [3] Sorba L, Bratina G, Antonini A, et al. Structure and local dipole of Si interface layers in AlAs-GaAs heterostructures [J]. Phys. Rev. B, 1992, 46(11): 6834-6845.

    [4] [4] Sorba L, Bratina G, Ceccone G, et al. Tuning AlAs-GaAs band discontinuities and the role of Si-induced local interface dipoles [J]. Phys. Rev. B, 1991, 43(3): 2450-2453.

    [5] [5] Schubert E F, Stark J B, Ullrich B, et al. Spatial localization of impurities in δ-doped GaAs [J]. Appl. Phys.Lett., 1988, 52(18):1508-1510.

    [6] [6] Schubert E F, Stark J B, Ullrich B, et al. Diffusion of atomic silicon in gallium arsenide [J]. Appl. Phys. Lett.,1988, 53:293-295.

    [8] [8] Martion G M, Mitonnear A, Mircea A. Electron traps in bulk and epitaxial GaAs crystal [J]. Electronics letters,1977, 13:191-194.

    [9] [9] Long D V, logan R A, Kimerling L C. Identification of the defect state associated with a gallium vacancy in GaAs and AlxGa1-xAs [J]. Phys. Rev. B, 1977, 15: 4874-4877.

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    [in Chinese], [in Chinese], [in Chinese]. Study of GaAs/Si/AlAs by DLTS technique[J]. Chinese Journal of Quantum Electronics, 2005, 22(6): 923

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    Paper Information

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    Received: Sep. 15, 2004

    Accepted: --

    Published Online: Jun. 12, 2006

    The Author Email: (yongpli@163.com)

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