Chinese Optics Letters, Volume. 10, Issue 6, 061202(2012)
Novel technique for characterizing feature profiles in photolithography process
A novel angle-resolved scatterometer based on pupil optimization for feature profile measurement in a photolithography process is proposed. The impact of image sensor errors is minimized by optimizing the intensity distribution of the incident light using a spatial light modulator. The scatterometry sensitivity of feature measurement at different polarization conditions is calculated using the rigorous coupled-wave and first-order analyses, and the reproducibility of the scatterometer is evaluated. The results show that the sensitivity and reproducibility of the angle-resolved scatterometer increase by 90% and 40% with pupil optimization, respectively.
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Fan Wang, Hailiang Lu, Qingyun Zhang, Anatoly Burov. Novel technique for characterizing feature profiles in photolithography process[J]. Chinese Optics Letters, 2012, 10(6): 061202
Category: Instrumentation, measurement, and metrology
Received: Nov. 15, 2011
Accepted: Dec. 28, 2011
Published Online: Mar. 13, 2012
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