Spectroscopy and Spectral Analysis, Volume. 39, Issue 11, 3433(2019)

Study on Measurement of the Damage Threshold of Silicon Nitride Ceramics under Pulsed Laser Irradiation by Spectroscopy

CAI Peng-cheng*... LI Shuang, CAI Hong-xing, TAN Yong, SHI Jing and MIAO Xin-hui |Show fewer author(s)
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    References(9)

    [1] [1] Hou X M, Wang E H, Li B, et al. Ceramics International, 2017, 43(5): 4344.

    [2] [2] Sun Y G, He S L, Liu R A, et al. China Ceramic Industry , 2016, 23: 31.

    [3] [3] Zhang Jingyang, Long Ying, Liao Shixian, et al. Ceramics International, 2017, 43: 2938.

    [4] [4] Kim J D, Lee S J, Suh J. J. Mech. Sci. Technol., 2011, 25(4): 995.

    [5] [5] Poulain G, Blanc D, Focsa A, et al. Energy Procedia, 2012, 27: 516.

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    [11] [11] ISO 212154-1 Lasers and Laser-Related Equipment——Test Methods for Laser-Induced Damage Threshold——Part 1: Definitions and General Principles, 2011.

    [12] [12] ISO 212154-2 Lasers and Laser-Related Equipment——Test Methods for Laser-Induced Damage Threshold——Part 2: Threshold Determination, 2011.

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    CAI Peng-cheng, LI Shuang, CAI Hong-xing, TAN Yong, SHI Jing, MIAO Xin-hui. Study on Measurement of the Damage Threshold of Silicon Nitride Ceramics under Pulsed Laser Irradiation by Spectroscopy[J]. Spectroscopy and Spectral Analysis, 2019, 39(11): 3433

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    Paper Information

    Received: Sep. 18, 2018

    Accepted: --

    Published Online: Dec. 2, 2019

    The Author Email: Peng-cheng CAI (cpcaba@126.com)

    DOI:10.3964/j.issn.1000-0593(2019)11-3433-05

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