Fig. 1. Block diagram of laser protection technology

Fig. 2. (a) Gaussian spatial profile of pumping pulse; (b) Reflectivity during the phase transformation; (c) Time resolved evolutions of the reflectivity for three different positions on the sample, corresponding to local fluences of (c1) 7 mJ/cm², (c2) 15 mJ/cm², and (c3) 25 mJ/cm²

Fig. 3. Response time of photoinduced transition as a function of pulse width, which ranges from 1.5 ps to 15 fs

Fig. 4. Schematic diagram of variable temperature Z-scan device

Fig. 5. Process for solution mixing and film synthesis

Fig. 6. (a) Reflectance and (b) transmittance spectra of the VO₂ film at selected temperatures during the heating process

Fig. 7. Electrical and optical properties of VO₂ thin film

Fig. 8. Transmittance spectra of VO₂-SiO₂ composite films upon increasing Si/V molar ratios in the wavelength ranges from 250 nm to 2500 nm. Solid line: 30 ℃; Dash line: 100 ℃

Fig. 9. (a) Simulated and (b) experimental transmittance of the limiter in the on and off-states. The inset in (b) is an SEM image of the fabricated device

Fig. 10. Diagram of the optical system

Fig. 11. Equivalent schematic of the composite imaging system

Fig. 12. Laser dazzling protection method combining digital micromirror device with the wavelength multiplexing technique

Fig. 13. (a) Optical layout diagram and (b) transmittance function of three-channel band compensation imaging method

Fig. 14. (a) Optical layout diagram and (b) transmittance function of dual-channel band compensation imaging method