Spectroscopy and Spectral Analysis, Volume. 37, Issue 6, 1946(2017)
Movable GaN Membrane Micro-Grating on Patterned SOI Substrate Deposited with Molecular Beam Epitaxy
As the third generation of semiconductor material, GaN has many advantages, such as wide bandgap, direct band gap, corrosion resistance and so on. Also, GaN is a very promising material for MOEMS. Because the etching of GaN material is not mature, epitaxial growth on patterned substrate is more helpful for GaN/SOI device. A movable GaN grating on patterned SOI substrate was designed and fabricated with Si micromaching and molecular beam epitaxy process of GaN. The grating actuated by a SOI electrostatic comb-drive micro-actuator could move in two dimensional directions and it could be used as filter in Terahertz wavelength. The period and width of the grating is 16 and 6 μm, respectively. The resonant wavelength is 25901 μm. An horizontal displacement of ±726 μm is obtained at 220 V of horizontal voltage with simulation. When the vertical voltage is 200 V, the displacement is 25 μm. The photoluminescence (PL) measurements of the deposited InGaN/GaN multiple quantum well on patterned SOI substrate are carried out with laser Raman spectrometer. The experimental results show that good optical property of the InGaN/GaN multiple quantum well. A wide emission wavelength from 350 to 500 nm is demonstrated. With the increase of temperature from 10 K to room temperature, the photoluminescence peak position appears a tendency of “S” shape because of the localized effect and band shrink in the InGaN/GaN quantum well.
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L Fan-min, LI Pei, WANG Yong-jin, HU Fang-ren, ZHU Wen-zhen. Movable GaN Membrane Micro-Grating on Patterned SOI Substrate Deposited with Molecular Beam Epitaxy[J]. Spectroscopy and Spectral Analysis, 2017, 37(6): 1946
Received: Nov. 26, 2015
Accepted: --
Published Online: Jul. 10, 2017
The Author Email: Fan-min L (lfm15951900071@163.com)