At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection

Yutaka Nagata; Tetsuo Harada; Takeo Watanabe; Hiroo Kinoshita; Katsumi Midorikawa

doi:10.1088/2631-7990/ab3b4e

International Journal of Extreme Manufacturing, Volume. 1, Issue 3, 32001(2019)

At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection

Yutaka Nagata¹, Tetsuo Harada², Takeo Watanabe², Hiroo Kinoshita², and Katsumi Midorikawa^1、*

Author Affiliations

¹RIKEN Center for Advanced Photonics, RIKEN, 2-1 Hirosawa, Wako Saitama 351-0198, Japan

²Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan

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Yutaka Nagata, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita, Katsumi Midorikawa. At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection[J]. International Journal of Extreme Manufacturing, 2019, 1(3): 32001

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Paper Information

Category: Topical Review

Received: Jul. 31, 2019

Accepted: --

Published Online: Jun. 4, 2020

The Author Email: Midorikawa Katsumi (kmidori@riken.jp)

DOI:10.1088/2631-7990/ab3b4e

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology