Opto-Electronic Engineering, Volume. 32, Issue 12, 21(2005)
Comparison between double exposure with two laser beams interference and single exposure with four laser beams
References(2)
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[2] [2] J.P.SPALLAS,R.D.BOYD,J.A.BRITTEN,et al.Fabrication of sub-0.5μm diameter cobalt dots on silicon substrates and photoresist pedestals on 50cm×50cm glass substrates using laser interference lithography[J].Journal of Vacuum Science & Technology B:Microelectronics and Nanometer Structures,1996,14(3):2005-2007.
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[in Chinese], [in Chinese], [in Chinese]. Comparison between double exposure with two laser beams interference and single exposure with four laser beams[J]. Opto-Electronic Engineering, 2005, 32(12): 21
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