Chinese Journal of Quantum Electronics, Volume. 31, Issue 1, 1(2014)

Recent advances in multilayer coatings for extreme ultraviolet lithography

Juan-juan QIN*, Wei-wei DONG, Shu ZHOU, Li-bing YOU, and Xiao-dong FANG
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  • [in Chinese]
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    Extreme ultraviolet lithography (EUVL) has become the key candidate of lithography tools to manufacture devices at the 22 nm node and beyond of semiconductor integrated circuit, which makes use of the extreme ultraviolet rays with 13.5 nm wavelength as the light source. It is one of approaches to construct a normal incidence optical system by using the excellent performance multilayer coatings. A review was given of the specification of the coatings for EUVL and the recent progress in multilayered systems. The key deposition methods and equipments that produce such coatings were discussed. Furthermore, in terms of high reflectance, wavelength matching, profile matching, life and stability, it also concludes the problems existed in the preparation technologies of the multilayered systems and the future development direction.

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    QIN Juan-juan, DONG Wei-wei, ZHOU Shu, YOU Li-bing, FANG Xiao-dong. Recent advances in multilayer coatings for extreme ultraviolet lithography[J]. Chinese Journal of Quantum Electronics, 2014, 31(1): 1

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    Paper Information

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    Received: May. 29, 2013

    Accepted: --

    Published Online: Feb. 26, 2014

    The Author Email: Juan-juan QIN (tiancaijuanjuan@126.com)

    DOI:10.3969/j.issn.1007-5461. 2014.01.001

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