Chinese Journal of Quantum Electronics, Volume. 29, Issue 6, 764(2012)
Alignment technology using matched filter correlation in projection lithography
A pattern recognition named phase-only matched filtering is presented to realize high precision alignment in projecting lithography. The method achieves the alignment with the characteristic direction of templates and silicon substrate using the coherent peak rotating sensitive feature in the filter. Meanwhile the relative translation distance of templates and silicon substrate is obtained in recognition algorithms. Such an alignment system is assembled in our mature projection lithography machine, and the experimental data obtained prove the higher accuracy and efficiency compared with conventional algorithms.
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LEI Liang, LI Lang-lin, ZHOU Jin-yun, WANG Qu. Alignment technology using matched filter correlation in projection lithography[J]. Chinese Journal of Quantum Electronics, 2012, 29(6): 764
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Received: Feb. 7, 2012
Accepted: --
Published Online: Nov. 29, 2012
The Author Email: Liang LEI (leiliang@gdut.edu.cn)