Optical Instruments, Volume. 41, Issue 6, 40(2019)
Fabrication of copper-based SERS substrates by magnetron sputtering
Figures & Tables(6)
Fig. 1. SEM images of surfaces for different sputtering parameters.
Fig. 3. SEM images of different sputtering parameters after dealloying for 2 hours
Fig. 4. SERS spectra of different dealloying time and different sputtering parameter（counts represents spectra intensity）
Table 1. EDS results of films prepared by magnetron sputtering
View tableView in ArticleTable 1. EDS results of films prepared by magnetron sputtering
溅射参数 Cu含量/% Ti含量/% O含量/% 射频 150 W 52.47 42.62 4.91 射频 200 W 52.99 43.71 3.30 射频 250 W 48.46 38.85 12.49 直流 150 W 53.98 42.37 3.65 直流 200 W 53.69 42.64 3.67 直流 250 W 51.43 40.97 7.60
Table 2. SERS enhance factor of different films after dealloying for 2 h
View tableView in ArticleTable 2. SERS enhance factor of different films after dealloying for 2 h
参数 平均增强因子 射频 150 W 6.9×106 射频 200 W 1.8×107 射频 250 W 4.2×106 直流 150 W 8.3×106 直流 200 W 6.2×106 直流 250 W 4.2×106
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Yu HE, Qiang LI, Ling ZHANG, Deng PAN, Qun SUN. Fabrication of copper-based SERS substrates by magnetron sputtering[J]. Optical Instruments, 2019, 41(6): 40
Paper Information
Category: DESIGN AND RESEARCH
Received: Mar. 30, 2019
Accepted: --
Published Online: May. 19, 2020
The Author Email: ZHANG Ling (lzhang@usst.edu.cn)
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